by: Fogal, Rich; Wood, Alan G.;

Condensed memory matrix

A condensed memory matrix is fabricated by conductively connecting the attachment bumps of a substrate with the attachment bumps of a wafer of DRAM chips and physically bonding the juxtaposed surfaces of the substrate and the wafer with a dielectric curable resin. An array of heat fins is bonded to the inactive surface of the wafer by a thermally conductive curable resin.






What is claimed is:

1. A condensed memory matrix, comprising:

a PCB substrate having a first surface and a second opposite surface;

an array of circuit connection structures carried on the first surface of said PCB substrate,

a first layer comprising a dielectric material in the interstices between said circuit connection structures;

a wafer having a first surface and a second surface opposite said first surface, the first surface having a plurality of memory dice formed thereon, and a portion of said wafer first surface carrying die connection structures juxtaposed against and in conductive relationship with the circuit connection structures carried by said PCB substrate first surface such that said first layer is also in the interstices between said die connection structures, the die connection structures connecting the plurality of memory dice of the wafer to the circuit connection structures carried by said PCB substrate;

a second layer comprising a thermally conductive, material located on a portion of a second surface of said wafer; and

a heat dissipation device connected to a portion of said second layer.

2. The condensed memory matrix according to claim 1, wherein said second layer is an electrically non-conductive layer.

3. The condensed memory matrix according to claim 1, wherein said second layer is an electrically conductive layer.

4. The condensed memory matrix according to claim 1, wherein said circuit connection structures are first attachment bumps and said die connection structures are second attachment bumps.

5. The condensed memory matrix according to claim 1, wherein said dielectric material includes a low stress, epoxy-based curable resin which bonds said substrate to said wafer.

6. The condensed memory matrix according to claim 1, wherein said second layer comprises an epoxy-based resin which bonds said wafer to said heat dissipation device.

7. The condensed memory matrix according to claim 1, wherein said heat dissipation device includes a metallic device having at least one heat fin located thereon.

8. The condensed memory matrix according to claim 1, wherein:

said circuit connection structures are first attachment bumps and said die connection structures are second attachment bumps;

said dielectric material comprises a low stress, epoxy-based curable resin which bonds said substrate to said wafer; and

said second layer comprises an epoxy-based resin which bonds said wafer to said heat dissipation device.

9. The condensed memory matrix according to claim 8, wherein said heat dissipation device includes a metallic device having a portion thereof configured as at least one heat fin.

10. A condensed memory matrix, wherein the improvement comprises:

a PCB substrate having a first surface and a second opposite surface;

an array of circuit connection structures carried on the first surface of said PCB substrate;

a first layer comprising a dielectric material in the interstices between said circuit connection structures;

a wafer having a first surface and a second surface opposite said first surface, the first surface having a plurality of memory dice formed thereon, and a portion of said wafer first surface carrying die connection structures juxtaposed against and in conductive relationship with the circuit connection structures carried by said PCB substrate first surface such that said first layer is also in the interstices between said die connection structures, the die connection structures connecting the plurality of memory dice of the wafer to the circuit connection structures carried by said PCB substrate;

a second layer comprising a thermally conductive material located on a portion of a second surface of said wafer; and

a heat dissipation device connected to a portion of said second layer.

11. The condensed memory matrix according to claim 10, wherein said circuit connection structures are first attachment bumps and said die connection structures are second attachment bumps.

12. The condensed memory matrix according to claim 10, wherein said dielectric material includes a low stress, epoxy-based curable resin which bonds said substrate to said wafer.

13. The condensed memory matrix according to claim 10, wherein said second layer comprises an epoxy-based resin which bonds said wafer to said heat dissipation device.

14. The condensed memory matrix according to claim 10, wherein said heat dissipation device includes a metallic device having at least one heat fin located thereon.

15. The condensed memory matrix according to claim 10, wherein:

said circuit connection structures are first attachment bumps and said die connection structures are second attachment bumps;

said dielectric material comprises a low stress, epoxy-based curable resin which bonds said substrate to said wafer; and

said second layer comprises an epoxy-based resin which bonds said wafer to said heat dissipation device.

16. The condensed memory matrix according to claim 15, wherein said heat dissipation device includes a metallic device having a portion thereof configured as at least one heat fin.


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